Facilities

Section Optica cleanroom facilities comprises setups for photolithography, RIE and wet chemical etching. For the productionof gratings, an interferometric setup (Ar-laser), equiped with UV optics (=365nm) is in use. An a-step is also available. The cleanroom facilities are partly shared with the Optical Communication Group of the Department of Electrical Engineering, which comprise setups for lithography, RIE, wet chemical and atomatic beam etching, together with an LPE reactor for InGaAsP/InP combinations. RTP and PE-CVD equipment is also available.

For more information: 
Marnix Schnitger, +31-(0)15-278 9605