Thin film tailoring facilities

Thin films are custom-made and materials are modified in subsurface regions by the following in-house facilities:

  • Ion-implantation
  • Plasma deposition
  • Laser deposition

Ion-implantation

The Reactor Institute houses a VARIAN/Extrion ion implanter operable up to 180 keV.

One application for which this facility is used extensively is to generate several types of nanoparticles (Li, Zn, CdSe) in several ceramic host single crystals (MgO, Al2O3). An example is Metal and Semiconductor nanoprecipitates in Oxides.

Plasma deposition

The institute houses two setups for plasma sputter deposition of materials on several types of substrates.
These setups can be used to produce thin films of metal hydrides of various composition. An example is Hydrogen Storage in Metal Hydrides.

Laser deposition

Besides plasma sputter deposition the institute houses further a laser ablation deposition setup employing a 1024 nm YAG laser.
These setups can be used to produce thin films of metal hydrides of various composition. An example is Hydrogen Storage in Metal Hydrides.

 

Name author: Menno Blaauw
© 2017 TU Delft

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